TOSHIBA HFAS11S Integrated Circuit Devices

TOSHIBA HFAS11S Integrated Circuit Devices

HFAS11S high temperature diffusion/oxidation system is a kind of thermal processing equipment used for diffusion, oxidation, annealing and alloying of wafers in the manufacturing process of semiconductor devices and integrated circuits, and also suitable for special temperature process treatment of other materials, and it is a kind of automatic control equipment used for long time continuous work with high precision and high stability.

HFAS11S In the semiconductor production process, the precision of the diffusion furnace temperature control and its working stability have become the decisive factor for the quality of semiconductor products. However, in the traditional control, the control and management of the diffusion furnace are completed by the instrumentation based on microcontroller, whose temperature control precision, production process control ability and automatic operation ability are low and difficult to realize centralized management, which leads to the defects of poor product quality and low production efficiency.

HFAS11S system for China’s semiconductor diffusion / oxidation process technology development status quo development and design, the use of advanced, reliable PLC as the control core, with a touch screen as the human-computer interface, with high-precision temperature detection circuits, the use of fuzzy self-tuning PID for the controller, can realize the complex process temperature control. It is characterized by high detection and control accuracy, good stability of working process, self-tuning of control parameters and convenient setting parameters.